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Spectroscopic studies of the Sn-based droplet laser plasma EUV source

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Date

2004

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Abstract

We have previously reported encouraging results with a new type of laser plasma source. As a radiation source at 13.5nm spectral band, tin has several advantages over xenon, not the least of which is the number of ion species within the plasma that contribute to the in-band emission. In this paper we report results from spectroscopic measurements of the laser plasma emission from 12 - 19nm from this target, together with hydrodynamic code simulations of the source, towards developing a suitable laser plasma source for EUV lithography.

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Keywords

EUV, Laser-plasmas, Sources, Tin plasmas

Citation

URI

https://dspace-test.anu.edu.au/handle/1885/733729337

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DevOps Pure Testing

Source

Proceedings of SPIE - The International Society for Optical Engineering

Type

Conference article

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DOI

10.1117/12.541575

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