Silane flow rate dependence of SiOx cap layer induced impurity free interdiffusion of GaAs/AlGaAs quantum wells

Deenapanray, Prakash; Tan, Hoe Hark; Cohen, M; Gaff, K; Petravic, Mladen; Jagadish, Chennupati

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Silane flow rate dependence of SiOx cap layer induced impurity free interdiffusion of GaAs/AlGaAs quantum wells

Date

2000

Authors

Deenapanray, Prakash

Tan, Hoe Hark

Cohen, M

Gaff, K

Petravic, Mladen

Jagadish, Chennupati

Publisher

Electrochemical Society Inc

URI

http://hdl.handle.net/1885/90416

Collections

Open Access Research

Source

Journal of the Electrochemical Society

Type

Journal article

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Cultural advice

Silane flow rate dependence of SiOx cap layer induced impurity free interdiffusion of GaAs/AlGaAs quantum wells

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