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Molecularly intact and dissociative adsorption of water on clean Cu(1 1 0)

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Date

2005-07-10

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Abstract

An X-ray photoelectron spectroscopy (XPS) study was undertaken of the water/Cu(1 1 0)-system finding non-dissociative adsorption on clean Cu(1 1 0) at temperatures below 150 K. Thermally induced dissociation of D2O is observed to occur above 150 K, similar to the H2O/Ru(0 0 1) system, with an experimentally derived activation barrier of 0.53-0.56 eV which is very close in magnitude to the derived activation barrier for desorption of 0.50-0.53 eV. X-ray and electron induced damage to the water overlayer was quantified and used to rationalize the results of a recent XPS study of the water/Cu(1 1 0)-system where partial dissociation was observed already at 90 K.

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Keywords

Copper, Low index single crystal surfaces, Molecule-solid reactions, Radiation damage, Ruthenium, Surface chemical reaction, Synchrotron radiation photoelectron spectroscopy, Water

Citation

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https://dspace-test.anu.edu.au/handle/1885/733757825

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DevOps Pure Testing

Source

Surface Science

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Article

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DOI

10.1016/j.susc.2005.04.024

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