Efficient 13.5 nm EUV generation from a laser plasma

Richardson, M.; Koay, C. S.; Takenoshita, K.; George, S.; Bernath, R.; Al-Rabban, M. M.; Bakshi, V.

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Efficient 13.5 nm EUV generation from a laser plasma

Date

2005

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Abstract

We describe a source of 13.5 nm radiation, based on multi-kHz laser-plasmas created from tin-bearing micro-droplets that has a high probability of satisfying the requirements for EUVL, the next generation lithography for computer chip fabrication.

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https://dspace-test.anu.edu.au/handle/1885/733738772

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DevOps Pure Testing

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Conference contribution

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Efficient 13.5 nm EUV generation from a laser plasma

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