Optimization of sidewall roughness in silica waveguides to reduce the propagation losses
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Abstract
Optimization of sidewall roughness (SWR) in silica waveguides to reduce the propagation losses was discussed. Fabrication techniques to form waveguides with vertical and smooth sidewall were also suggested. It was shown that the vertical profile and smooth sidewall can be fabricated using an etch chamber equipped with a silicon clamp. The results showed that the smooth sidewalls offers lower propagation loss and reduced sensitivity to polarization.