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A protective layer on As2S3 film for photo-resist patterning

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Date

2008

Authors

Choi, Duk-Yong
Madden, Steve
Rode, Andrei V
Wang, Rongping
Bulla, Douglas
Luther-Davies, Barry

Journal Title

Journal ISSN

Volume Title

Publisher

Elsevier

Abstract

We have developed an effective fabrication process for As2S3 planar waveguides. A bottom anti-reflection coating provides a layer that not only protects the As2S3 film from attack by the alkaline developer but also improves line edge roughness of photo-resist patterns which is a pre-requisite for waveguides with smooth sidewalls. Crown

Description

Keywords

Citation

URI

http://hdl.handle.net/1885/50387

Collections

Open Access Research

Source

Journal of Non-crystalline Solids

Type

Journal article

Book Title

Entity type

Access Statement

License Rights

DOI

10.1016/j.jnoncrysol.2008.05.067

Restricted until

2037-12-31

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Description
01_Choi_A_protective_layer_on_As2S3_2008.pdf (119.43 KB)

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