Optical modulators in the 500-600-nm visible wavelength regime using an Al xGa 1-xAs/Al yGa 1-yAs MOCVD-grown AFPM
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Visible modulators are of current interest due to their potential use in the high-density data storage applications. Recently we demonstrated the successful operation of a modulator working at 660 nm. This work, look at the possibility of design and fabrication of a modulator operating below 600 nm. An efficient approach to designing such modulators is to initially grown and characterize the two main components separately, namely the back mirror and the active multiple quantum well structure.
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Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS