Fabrication process development for AS2S3 planar waveguides using standard semiconductor processing

Choi, Duk Yong; Madden, Steve; Rode, Andrei; Wang, Rongping; Luther-Davies, Barry

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Fabrication process development for AS2S3 planar waveguides using standard semiconductor processing

Date

2007

Authors

Abstract

We have developed an effective fabrication process for As2S 3 waveguides. A bottom anti-reflection coating provides a suitable layer to protect the As2S3 film from attack by the alkaline developer whilst CHF3 plasma enables the patterning of waveguides with vertical-profile and smooth side walls.